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    반도체용 형광 X-선 분석장치 Wafer X310
  • Wafer size : up to 300mm
  • Multi layer film analysis
  • 동시 분석 film thickness and composition
  • FOUP (SMIF) 장착 가능
  • Multi point measuremment
  • GEM 300 대응
  • 반도체용 형광 X-선 분석장치
    Wafer X310
  • Wafer size : up to 300mm
  • Multi layer film analysis
  • 동시 분석 film thickness and composition
  • FOUP (SMIF) 장착 가능
  • Multi point measuremment
  • GEM 300 대응
  • Product Features 제품특징

    Wafer X310

    Wafer size : up to 300mm
    Multi layer film analysis
    동시 분석 film thickness and composition
    FOUP (SMIF) 장착 가능
    Multi point measuremment
    GEM 300 대응

    • 분석 원소: 4Be~92U
    • 300 mm사이즈까지의 웨이퍼상의 각종 박막의 두께와 조성 측정
    • X-Y-θ-Z구동 방식
    • 4 kW의 고파워 X-선관
    • 금속막 측정을 위해 70μm의 조사 spot 사이즈의 X선원을 미소 부위나 edge부분까지의 막 두께 및 조성 분석 가능
    • 반도체 공정: BPSG, SiO2, Si3N4, Doped polySi(B, P, N, As), Wsix, Al-Cu, TiW, TiN, TaN, PZT, BST, SBT, MRAM
    • 금속막: Mo, Ti, Co, Ni, Al, Cu, Ir, Pt, Ru 등  
    • 자기 디스크: CoCrTa, CoCrPt, DLC, NiP 등  
    • 광학 자기 디스크: Tb-FeCo 등  
    • 자기 헤드: GMR, TMR 등
    • FOUP/SMIF interface
    • 200 mm/300 mm 대응
    • AMHS에 대응 및 SECS/GEM 프로토콜의 대응
    Specifications 제품사양
    Specifications
    Wafer size300mm, 200mm (200mm using wafer adapter)
    Simultaneous analysis elements 20 elements Maximum
    Fixed type (4Be ~ 92U)
    Heavy element scan type (22Ti ~ 92U)
    Aperture 3 position with auto changer
    standard : 10mm, 20mm, 40mm dia)
    optional : 5mm, 15mm dia
    X-ray tube Rh target, Maximum rating 4kW
    Detector S-PC, SC, F-PC (PR gas required)
    Wafer stage r θ Φ Z stage
    Analysis spot r θ designation, r : 1mm, θ : 1deg step
    X-Y designation 1mm step
    Sample spin mechanism 4 rpm (available only for wafer center analysis
    Carrier 300mm FOUP (25 wafer)
    Vacuum pump Dry pump
    Stabilizing system Temperature stabilizer, Automatic vacuum control system
    EFEM FFU with ULPA filter
    Data processing system Personal computer with windows
    software
    film thickness / concentration simultaneous analysis software /
    Fundamental parameters software for thin film analysis
    Compliant with on-line communication standards SECS / GEM300 (optoinal)
    Compliant with safety standards SEMI S2, S8, S14, S22, CE marking (optional)
    Others Through - the - wall, etc can be accommodated upon request
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