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Load Lock Etch System is a Flagship product addressing several significant markets.
This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.
이온빔 원자층 식각 장비 Infinity Ion Beam Etching Load Lock type
Load Lock Etch System is a Flagship product addressing several significant markets.
This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.
이온빔 원자층 식각 장비
Infinity Ion Beam Etching Load Lock type
Product Features
제품특징
Infinity Ion Beam Etching Load Lock type
- Markets -
Semi-Conductor
Data Storage
MEMS
Wafer processing services
- Applications -
Delayering (Failure Analysis/Reverse Engineering)
Patterned Etch
Specifications
제품사양
| Specifications | ||
| Atomic layer Etching Load Lock type | 12cm & 22cm Gridded RF Ion Sources | |
| 3 x 8″ target carousel | ||
| 300mm diameter process surface Deposition Uniformity < 3% | ||
| Repeatability <1% | ||
| Substrate plasma pre-cleaning | ||
| Single Platten Load Locked Stage | ||
| Multi substrate fixturing > 500 hrs MTBF | ||
Video
관련영상
