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    이온빔 원자층 식각 장비 Atomic layer Etching Load Lock type
  • Load Lock Etch System is a Flagship product addressing several significant markets.
  • This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.
  • 이온빔 원자층 식각 장비
    Atomic layer Etching Load Lock type
  • Load Lock Etch System is a Flagship product addressing several significant markets.
  • This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.
  • Product Features 제품특징

    Atomic layer Etching Load Lock type

    - Markets -
    Semi-Conductor
    Data Storage
    MEMS
    Wafer processing services


    - Applications -
    Delayering (Failure Analysis)
    Patterned Etch

    Specifications 제품사양
    Specifications
    Atomic layer Etching Load Lock type12cm & 22cm Gridded RF Ion Sources
    3 x 8″ target carousel
    300mm diameter process surface Deposition Uniformity < 3%
    Repeatability <1%
    Substrate plasma pre-cleaning
    Single Platten Load Locked Stage
    Multi substrate fixturing > 500 hrs MTBF
    Video 관련영상
    Related 관련제품