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					The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering.				 
					
This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition Patterned Etch				 						
		
		
	
	
	
			이온빔 식각/스퍼터 장비			Z-Flex System
			
				
					The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering.				 
					
This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition Patterned Etch				 					
		 
			이온빔 식각/스퍼터 장비
			Z-Flex System
			
			
				Product Features
				제품특징
				
					Z-Flex System
- Markets Include -
Data Storage
Thin Film Magnetics
Semiconductor
Reactive Ion Assisted Etching
Etching and overcoat processing
- Applications -
Disk Slider fabrication
TMR and GMR applications
Semiconductor Failure Analysis
FINFET and advanced memory development
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