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    이온빔 식각/스퍼터 장비 Z-Flex System
  • The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering.
  • This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition Patterned Etch
  • 이온빔 식각/스퍼터 장비
    Z-Flex System
  • The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering.
  • This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition Patterned Etch
  • Product Features 제품특징

    Z-Flex System

    - Markets Include -
    Data Storage
    Thin Film Magnetics
    Semiconductor
    Reactive Ion Assisted Etching
    Etching and overcoat processing


    - Applications -
    Disk Slider fabrication
    TMR and GMR applications
    Semiconductor Failure Analysis
    FINFET and advanced memory development

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