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    Biased Target 스퍼터 장비 Infinity Biased Target Sputtering System
  • Denton Vacuum의 Biased target sputtering 기술을 사용하여 기존의 Ion Beam sputtering 보다 더 높은 성능을 제공하는 Sputtering 장비 입니다.
  • Biased Target 스퍼터 장비
    Infinity Biased Target Sputtering System
  • Denton Vacuum의 Biased target sputtering 기술을 사용하여 기존의 Ion Beam sputtering 보다 더 높은 성능을 제공하는 Sputtering 장비 입니다.
  • Product Features 제품특징

    Infinity Biased Target Sputtering System

    Biased target sputtering 기술을 활용해 기존의 Ion beam sputtering보다 더 높은 성능을 제공합니다.

    Biased target sputtering -> Independent control of ion currents and energies, interface engineering
    Low process pressure -> Large mean free path/Collimation/Dense films
    Electronic shuttering -> Instantaneous start/stop/Repeatability
    Compatible with front-end options -> Easily scalable to meet throughput demands
    Automation software -> Enhanced process control
    Short MTTR/Long MTBF -> High system uptime and ease of maintenance

    • Use Biased target

      No contamination

      No filaments

      No beam over-spill

    • Benefits include

      Wide range of process pressures

      Control of adatom energies

      Excellent uniformity and repeatability

      Low defect and low contamination

      Atomically engineered thin-film interfaces and surfaces

    • Applications

      Precision optics (HAMR, EUV)

      VCSEL anti-reflective coatings

      Next-gen VOx microbolometers

      High-efficiency solar cells

      Spin valves for magnetic recording