Infinity Biased Target Sputtering System

Biased target sputtering 기술을 활용해 기존의 Ion beam sputtering보다 더 높은 성능을 제공합니다.

Biased target sputtering -> Independent control of ion currents and energies, interface engineering
Low process pressure -> Large mean free path/Collimation/Dense films
Electronic shuttering -> Instantaneous start/stop/Repeatability
Compatible with front-end options -> Easily scalable to meet throughput demands
Automation software -> Enhanced process control
Short MTTR/Long MTBF -> High system uptime and ease of maintenance

• Use Biased target

  No contamination
  

  No filaments
  

  No beam over-spill

• Benefits include

  Wide range of process pressures
  

  Control of adatom energies
  

  Excellent uniformity and repeatability
  

  Low defect and low contamination
  

  Atomically engineered thin-film interfaces and surfaces

• Applications

  Precision optics (HAMR, EUV)
  

  VCSEL anti-reflective coatings
  

  Next-gen VOx microbolometers
  

  High-efficiency solar cells
  

  Spin valves for magnetic recording